China has built a prototype of an extreme ultraviolet lithography machine that’s critical for manufacturing advanced semiconductors, as the country steps up its effort to produce advanced chips without relying on Western technology suppliers, Reuters reported. The prototype of the EUV machine that etches circuits onto silicon wafers to make chips, was built in early 2025 by a team of former engineers of Dutch chip equipment maker ASML, according to Reuters. The team reverse-engineered ASML’s EUV machine to build the prototype. The Chinese government has set a goal of producing working chips using the prototype by 2028, the report said. As the U.S. tries to prevent #🇨🇳 ChinA.I. 🤖🧠🦾🤖 from building its own advanced chips, Washington has imposed export controls to restrict Chinese companies’ access to ASML’s EUV machines. But the existence of the prototype suggests that China may be overcoming technological hurdles to develop its own chip manufacturing equipment. Tech giant Huawei Technologies is playing a key role in China’s EUV project by working with thousands of engineers and coordinating many companies and government research institutes across the country, according to Reuters. reuters.com/world/china/h..